First cycle
degree courses
Second cycle
degree courses
Single cycle
degree courses
School of Science
Course unit
SCL1000406, A.A. 2019/20

Information concerning the students who enrolled in A.Y. 2018/19

Information on the course unit
Degree course Second cycle degree in
SC1174, Degree course structure A.Y. 2015/16, A.Y. 2019/20
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Degree course track Common track
Number of ECTS credits allocated 6.0
Type of assessment Mark
Course unit English denomination NANOFABRICATION
Department of reference Department of Chemical Sciences
E-Learning website
Mandatory attendance No
Language of instruction English
Single Course unit The Course unit can be attended under the option Single Course unit attendance
Optional Course unit The Course unit can be chosen as Optional Course unit

Teacher in charge FILIPPO ROMANATO FIS/03

ECTS: details
Type Scientific-Disciplinary Sector Credits allocated
Educational activities in elective or integrative disciplines FIS/03 Material Physics 6.0

Course unit organization
Period First semester
Year 2nd Year
Teaching method frontal

Type of hours Credits Teaching
Hours of
Individual study
Lecture 6.0 48 102.0 No turn

Start of activities 30/09/2019
End of activities 18/01/2020
Show course schedule 2019/20 Reg.2015 course timetable

Examination board
Examination board not defined

Prerequisites: Single-cycle degree
Target skills and knowledge: Knowledge about the main lithographic techniques, processes and methodologies of nanofabrication.
Ability to correlate phenomena and properties of materials and techniques for obtaining and developing nanofabrication technologies.
Examination methods: Oral exam, presentation of the work and assessment of the main concepts of nano lithography. A depth study of a topic will presented after a written report preparation.
Assessment criteria: The assessment of the preparation will be based on the student's understanding of the topics and his/her ability to make connections between different subjects.
Course unit contents: Many of the impressive technical and scientific progress of the last two decades and 'based on the ability' to control individual chemical and physical phenomena at the level of a few nanometers that 'the scale of size which occurs most natural phenomena. This control and 'was obtained by developing systems and processes of micro and nano fabrication for the realization of devices (also referred to as lab-on-chip) capable of exchanging signals (detection and implementation) systems with the size of few nanometers coining, in fact The definition of nanotechnology.

The course will discuss the process of miniaturization of the devices and the how the scale reduction can change or generate many (new) phenomena that distinguish the operation of nanodevices. We will present the main technologies for nanofabrication and we will show examples of application for the construction of devices and experiments at nanoscience. After a general distinction between processes top-down and bottom-up, we will explained the technology of lithography (UV, electronic, X-ray, ion imprinting, interference etc.), the processes of deposition (plasma assisted, or chemical vapor phase, sol-gel, etc.) and etching in the gas (reactive ion etching, milling) or liquid (chemical etching) phase. We will review manufacturing technology of electronic devices based on silicon.

The course is orinted to students in view of their thesis also looking at the broad correlation between physical, chemical, bio-chemical phenomena involved in the creation of nanostructures and nanodevices. The course covers issues of industrial nanotecnotecnology research.

The course is complemented by visits in nanofabrication laboratory in Trieste at the laboratories of the CNR nanofabrication at the synchrotron Elettra. During these visits they will have practical demonstrations of lithographic processes during the course in the classroom.

Syllabus: Nanofabrication:
Nanofabrication: general concepts
Types of lithographs: Top down and bootom-up
Mask - mask less lithography parallel serial
Types of processes sotrattivi
Process development
The role of nanofabrication in production processes
The methodological approach of nanofabrication: interdisciplinary thematic.

Lithographs and Device Types
Diffractive optics,
Electronic devices, lab-on-chip, etc.
Lithographs 2D and 3D

Resolutions vs. throughput
Lithographs tridimensioni
Combinations of lithographs

FIB (Focused ion beam)
Resist less
Mask less lithography
First type of lithography
Introduction to resist: ownership 'and lithographic process
types of resist

Processes on the resist

Dose and development
Contrast, resolution,
Litographic sensibility
Photochemical Quantum efficiency
Plasma etching resistance
Electron beam lithography
Electron sources
Vector scan
Beam blanking
Interaction with electron beam
Energy dependence
Proximity effects - dose correlation
Resolution limit
Exposure time
Single LEVEL- multi levels

Generality 'on lithographic techniques parallel
Replica of pattern

UV lithography
UV lithography proximity '
UV lithography far field

Optical lithography
General principles

Interference Lithography
Principle of 'interference
Mode '
Property '
X-ray lithography
LTX proximity '
X-ray lithography far field
Deep X-ray
Next generation Deep EUV
Alignment and exposure
Several step processes
Planned learning activities and teaching methods: The course includes both lectures and visits at some clean rooms to participate to practical demonstrations of nanofabrication techniques
Additional notes about suggested reading: Classroom presentations and book chapters and articles on specific lithographic techniques are dispensed.
Textbooks (and optional supplementary readings)

Innovative teaching methods: Teaching and learning strategies
  • Lecturing
  • Laboratory
  • Action learning
  • Story telling
  • Problem solving

Innovative teaching methods: Software or applications used
  • Moodle (files, quizzes, workshops, ...)
  • Mathematica
  • Matlab