Second cycle degree in MATERIALS SCIENCE

Campus: PADOVA

Language: English

Teaching period: First Semester


Number of ECTS credits allocated: 6

Prerequisites: Single-cycle degree
Examination methods: Oral exam, presentation of the work and assessment of the main concepts of nano lithography. A depth study of a topic will presented after a written report preparation.
Course unit contents: Many of the impressive technical and scientific progress of the last two decades and 'based on the ability' to control individual chemical and physical phenomena at the level of a few nanometers that 'the scale of size which occurs most natural phenomena. This control and 'was obtained by developing systems and processes of micro and nano fabrication for the realization of devices (also referred to as lab-on-chip) capable of exchanging signals (detection and implementation) systems with the size of few nanometers coining, in fact The definition of nanotechnology.

The course will discuss the process of miniaturization of the devices and the how the scale reduction can change or generate many (new) phenomena that distinguish the operation of nanodevices. We will present the main technologies for nanofabrication and we will show examples of application for the construction of devices and experiments at nanoscience. After a general distinction between processes top-down and bottom-up, we will explained the technology of lithography (UV, electronic, X-ray, ion imprinting, interference etc.), the processes of deposition (plasma assisted, or chemical vapor phase, sol-gel, etc.) and etching in the gas (reactive ion etching, milling) or liquid (chemical etching) phase. We will review manufacturing technology of electronic devices based on silicon.

The course is orinted to students in view of their thesis also looking at the broad correlation between physical, chemical, bio-chemical phenomena involved in the creation of nanostructures and nanodevices. The course covers issues of industrial nanotecnotecnology research.

The course is complemented by visits in nanofabrication laboratory in Trieste at the laboratories of the CNR nanofabrication at the synchrotron Elettra. During these visits they will have practical demonstrations of lithographic processes during the course in the classroom.

Syllabus: Nanofabrication:
Nanofabrication: general concepts
Types of lithographs: Top down and bootom-up
Mask - mask less lithography parallel serial
Types of processes sotrattivi
Process development
The role of nanofabrication in production processes
The methodological approach of nanofabrication: interdisciplinary thematic.

Lithographs and Device Types
Diffractive optics,
Electronic devices, lab-on-chip, etc.
Lithographs 2D and 3D

Resolutions vs. throughput
Lithographs tridimensioni
Combinations of lithographs

FIB (Focused ion beam)
Resist less
Mask less lithography
First type of lithography
Introduction to resist: ownership 'and lithographic process
types of resist

Processes on the resist

Dose and development
Contrast, resolution,
Litographic sensibility
Photochemical Quantum efficiency
Plasma etching resistance
Electron beam lithography
Electron sources
Vector scan
Beam blanking
Interaction with electron beam
Energy dependence
Proximity effects - dose correlation
Resolution limit
Exposure time
Single LEVEL- multi levels

Generality 'on lithographic techniques parallel
Replica of pattern

UV lithography
UV lithography proximity '
UV lithography far field

Optical lithography
General principles

Interference Lithography
Principle of 'interference
Mode '
Property '
X-ray lithography
LTX proximity '
X-ray lithography far field
Deep X-ray
Next generation Deep EUV
Alignment and exposure
Several step processes